Advances in mirror technology for X-ray, EUV lithography, laser and other applications View on Open Library

Advances in mirror technology for X-ray, EUV lithography, laser and other applications

by Ali M. Khounsary , Udo Dinger

No reviews yet
First published: 2004 1 language ISBN: 0819450669
Subjects
Optical radiometry Lasers Mirrors Congresses Optical coatings Design and construction Extreme ultraviolet lithography Optics

Reviews

Log in or sign up to write a review.

No reviews yet. Be the first!

More by Ali M. Khounsary

Advances in X-ray/Euv Optics, Components, and Applications

Advances in X-ray/Euv Optics, Components...

Advances in laboratory-based X-ray sources and optics III

Advances in laboratory-based X-ray sourc...

Advances in mirror technology for X-ray, EUV lithography, laser and other applications II

Advances in mirror technology for X-ray,...

Advances in laboratory-based X-ray sources and optics

Advances in laboratory-based X-ray sourc...

Advances in X-Ray/EUV Optics and Components XI

Advances in X-Ray/EUV Optics and Compone...

Advances in Laboratory-Based X-Ray Sources, Optics, and Applications V

Advances in Laboratory-Based X-Ray Sourc...

You Might Also Like

More in Optical radiometry
Visual measurements

Visual measurements

C. James Bartleson
Recommended practice, symbols, terms, units, and uncertainty analysis for radiometric sensor calibration

Recommended practice, symbols, terms, un...

Clair L. Wyatt
Optical Radiometry for Ocean Climate Measurements

Optical Radiometry for Ocean Climate Mea...

Giuseppe Zibordi
Color

Color

Steven A. Shafer
Penetrating radiation systems and applications V

Penetrating radiation systems and applic...

F. Patrick Doty
Penetrating radiation systems and applications VI

Penetrating radiation systems and applic...

F. Patrick Doty